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1 Ergebnisse
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Investigation of Inrush Current Induced Trench Gate Degrada..:
Zhao, Hanqing
;
Li, Xuan
;
Wu, Yifan
...
IEEE Transactions on Power Electronics. 39 (2024) 5 - p. 4947-4951 , 2024
Link:
https://doi.org/10.1109/tpel.2023.3348871
RT Journal T1 <Title>Investigation of Inrush Current Induced Trench Gate Degradation Inside SiC Mosfet by New Fowler–Nordheim Localization Methodology</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_tpel.2023.3348871&Exemplar=1&LAN=DE A1 Zhao, Hanqing A1 Li, Xuan A1 Wu, Yifan A1 Yang, Rui A1 Lou, Qian A1 Li, Lingfeng A1 Deng, Xiaochuan A1 Zhang, Bo PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0885-8993 SN 1941-0107 JF IEEE Transactions on Power Electronics VO 39 IS 5 SP 4947 OP 4951 LK http://dx.doi.org/https://doi.org/10.1109/tpel.2023.3348871 DO https://doi.org/10.1109/tpel.2023.3348871 SF ELIB - SuUB Bremen
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