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Study of the Influence of Different Gate Oxide Traps on Thr..:
Guo, Chunsheng
;
Cui, Shaoxiong
;
Li, Yumeng
...
IEEE Transactions on Power Electronics. 39 (2024) 8 - p. 9629-9637 , 2024
Link:
https://doi.org/10.1109/tpel.2024.3397672
RT Journal T1 <Title>Study of the Influence of Different Gate Oxide Traps on Threshold Voltage Drift of SiC MOSFET Based on Transient Current</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_tpel.2024.3397672&Exemplar=1&LAN=DE A1 Guo, Chunsheng A1 Cui, Shaoxiong A1 Li, Yumeng A1 Yao, Bojun A1 Zhang, Yamin A1 Zhu, Hui A1 Zhang, Meng A1 Feng, Shiwei PB Institute of Electrical and Electronics Engineers (IEEE) YR 2024 SN 0885-8993 SN 1941-0107 JF IEEE Transactions on Power Electronics VO 39 IS 8 SP 9629 OP 9637 LK http://dx.doi.org/https://doi.org/10.1109/tpel.2024.3397672 DO https://doi.org/10.1109/tpel.2024.3397672 SF ELIB - SuUB Bremen
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