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1 Ergebnisse
1
Virtual Metrology for Etch Profile in Silicon Trench Etchin..:
Choi, Jeong Eun
;
Park, Hyoeun
;
Lee, Yongho
.
IEEE Transactions on Semiconductor Manufacturing. 35 (2022) 1 - p. 128-136 , 2022
Link:
https://doi.org/10.1109/tsm.2021.3138918
RT Journal T1 <Title>Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_tsm.2021.3138918&Exemplar=1&LAN=DE A1 Choi, Jeong Eun A1 Park, Hyoeun A1 Lee, Yongho A1 Hong, Sang Jeen PB Institute of Electrical and Electronics Engineers (IEEE) YR 2022 SN 0894-6507 SN 1558-2345 JF IEEE Transactions on Semiconductor Manufacturing VO 35 IS 1 SP 128 OP 136 LK http://dx.doi.org/https://doi.org/10.1109/tsm.2021.3138918 DO https://doi.org/10.1109/tsm.2021.3138918 SF ELIB - SuUB Bremen
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