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Systematic Search for Stabilizing Dopants in ZrO₂ and HfO₂ ..:
Harashima, Yosuke
;
Koga, Hiroaki
;
Ni, Zeyuan
...
IEEE Transactions on Semiconductor Manufacturing. 36 (2023) 4 - p. 543-546 , 2023
Link:
https://doi.org/10.1109/tsm.2023.3265658
RT Journal T1 <Title>Systematic Search for Stabilizing Dopants in ZrO₂ and HfO₂ Using First-Principles Calculations</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1109_tsm.2023.3265658&Exemplar=1&LAN=DE A1 Harashima, Yosuke A1 Koga, Hiroaki A1 Ni, Zeyuan A1 Yonehara, Takehiro A1 Katouda, Michio A1 Notake, Akira A1 Matsui, Hidefumi A1 Moriya, Tsuyoshi A1 Si, Mrinal Kanti A1 Hasunuma, Ryu A1 Uedono, Akira A1 Shigeta, Yasuteru PB Institute of Electrical and Electronics Engineers (IEEE) YR 2023 SN 0894-6507 SN 1558-2345 JF IEEE Transactions on Semiconductor Manufacturing VO 36 IS 4 SP 543 OP 546 LK http://dx.doi.org/https://doi.org/10.1109/tsm.2023.3265658 DO https://doi.org/10.1109/tsm.2023.3265658 SF ELIB - SuUB Bremen
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