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Erratum: Diffusion saturation of undoped hydrated amorphous..:
Kabalbin, A. N.
;
Neimash, V. B.
;
Tsmots', V. M.
.
Semiconductors. 32 (1998) 8 - p. 916-916 , 1998
Link:
https://doi.org/10.1134/1.1187348
RT Journal T1
Erratum: Diffusion saturation of undoped hydrated amorphous silicon by tin impurity [Semiconductors 32, 263–266 .March 1998]
UL https://suche.suub.uni-bremen.de/peid=cr-10.1134_1.1187348&Exemplar=1&LAN=DE A1 Kabalbin, A. N. A1 Neimash, V. B. A1 Tsmots', V. M. A1 Shtym, V. S. PB Pleiades Publishing Ltd YR 1998 SN 1063-7826 SN 1090-6479 JF Semiconductors VO 32 IS 8 SP 916 OP 916 LK http://dx.doi.org/https://doi.org/10.1134/1.1187348 DO https://doi.org/10.1134/1.1187348 SF ELIB - SuUB Bremen
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