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Optimizing the Position of a Rotating Substrate during Magn..:
Rogov, A. V.
;
Kapustin, Yu. V.
Instruments and Experimental Techniques. 62 (2019) 1 - p. 109-115 , 2019
Link:
https://doi.org/10.1134/s0020441219010160
RT Journal T1 <Title>Optimizing the Position of a Rotating Substrate during Magnetron Deposition of Thickness-Uniform Coatings</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1134_s0020441219010160&Exemplar=1&LAN=DE A1 Rogov, A. V. A1 Kapustin, Yu. V. PB Pleiades Publishing Ltd YR 2019 SN 0020-4412 SN 1608-3180 JF Instruments and Experimental Techniques VO 62 IS 1 SP 109 OP 115 LK http://dx.doi.org/https://doi.org/10.1134/s0020441219010160 DO https://doi.org/10.1134/s0020441219010160 SF ELIB - SuUB Bremen
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