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1 Ergebnisse
1
Effect of the Chloropentafluoroethane Additive in Chlorine-..:
Okhapkin, A. I.
;
Kraev, S. A.
;
Arkhipova, E. A.
...
Semiconductors. 55 (2021) 11 - p. 865-868 , 2021
Link:
https://doi.org/10.1134/s1063782621100171
RT Journal T1
Effect of the Chloropentafluoroethane Additive in Chlorine-Containing Plasma on the Etching Rate and Etching-Profile Characteristics of Gallium Arsenide
UL https://suche.suub.uni-bremen.de/peid=cr-10.1134_s1063782621100171&Exemplar=1&LAN=DE A1 Okhapkin, A. I. A1 Kraev, S. A. A1 Arkhipova, E. A. A1 Daniltsev, V. M. A1 Khrykin, O. I. A1 Yunin, P. A. A1 Drozdov, M. N. PB Pleiades Publishing Ltd YR 2021 SN 1063-7826 SN 1090-6479 JF Semiconductors VO 55 IS 11 SP 865 OP 868 LK http://dx.doi.org/https://doi.org/10.1134/s1063782621100171 DO https://doi.org/10.1134/s1063782621100171 SF ELIB - SuUB Bremen
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