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1 Ergebnisse
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Limiting Thickness of Pore Walls Formed in Processes of Ano..:
Zegrya, G. G.
;
Ulin, V. P.
;
Zegrya, A. G.
...
Technical Physics. 68 (2023) 12 - p. 814-817 , 2023
Link:
https://doi.org/10.1134/s1063784223080376
RT Journal T1
Limiting Thickness of Pore Walls Formed in Processes of Anode Etching of Heavily Doped Semiconductors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1134_s1063784223080376&Exemplar=1&LAN=DE A1 Zegrya, G. G. A1 Ulin, V. P. A1 Zegrya, A. G. A1 Freiman, V. M. A1 Ulin, N. V. A1 Fadeev, D. V. A1 Savenkov, G. G. PB Pleiades Publishing Ltd YR 2023 SN 1063-7842 SN 1090-6525 JF Technical Physics VO 68 IS 12 SP 814 OP 817 LK http://dx.doi.org/https://doi.org/10.1134/s1063784223080376 DO https://doi.org/10.1134/s1063784223080376 SF ELIB - SuUB Bremen
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