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Effect of Formation Conditions for Hafnium Oxide Films on S..:
Afanasyev, M. S.
;
Belorusov, D. A.
;
Kiselev, D. A.
..
Journal of Communications Technology and Electronics. 68 (2023) 10 - p. 1191-1196 , 2023
Link:
https://doi.org/10.1134/s1064226923100017
RT Journal T1 <Title>Effect of Formation Conditions for Hafnium Oxide Films on Structural and Electrophysical Properties of Heterostructures</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1134_s1064226923100017&Exemplar=1&LAN=DE A1 Afanasyev, M. S. A1 Belorusov, D. A. A1 Kiselev, D. A. A1 Luzanov, V. A. A1 Chucheva, G. V. PB Pleiades Publishing Ltd YR 2023 SN 1064-2269 SN 1555-6557 JF Journal of Communications Technology and Electronics VO 68 IS 10 SP 1191 OP 1196 LK http://dx.doi.org/https://doi.org/10.1134/s1064226923100017 DO https://doi.org/10.1134/s1064226923100017 SF ELIB - SuUB Bremen
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