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1 Ergebnisse
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Study of Oxidation of TiSi2 Thin Film by XPS:
Yang, Wei Yi
;
Iwakuro, Hiroaki
;
Yagi, Hideichi
..
Japanese Journal of Applied Physics. 23 (1984) 12R - p. 1560 , 1984
Link:
https://doi.org/10.1143/jjap.23.1560
RT Journal T1 <Title>Study of Oxidation of TiSi2 Thin Film by XPS</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.23.1560&Exemplar=1&LAN=DE A1 Yang, Wei Yi A1 Iwakuro, Hiroaki A1 Yagi, Hideichi A1 Kuroda, Tsukasa A1 Nakamura, Shogo PB IOP Publishing YR 1984 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 23 IS 12R SP 1560 LK http://dx.doi.org/https://doi.org/10.1143/jjap.23.1560 DO https://doi.org/10.1143/jjap.23.1560 SF ELIB - SuUB Bremen
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