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The Role of Fluorine Termination in the Chemical Stability ..:
Sunada, Takeshi
;
Yasaka, Tatsuhiro
;
Takakura, Masaru
...
Japanese Journal of Applied Physics. 29 (1990) 12A - p. L2408 , 1990
Link:
https://doi.org/10.1143/jjap.29.l2408
RT Journal T1
The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.29.l2408&Exemplar=1&LAN=DE A1 Sunada, Takeshi A1 Yasaka, Tatsuhiro A1 Takakura, Masaru A1 Sugiyama, Tsutomu A1 Miyazaki, Seiichi A1 Hirose, Masataka PB IOP Publishing YR 1990 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 29 IS 12A SP L2408 LK http://dx.doi.org/https://doi.org/10.1143/jjap.29.l2408 DO https://doi.org/10.1143/jjap.29.l2408 SF ELIB - SuUB Bremen
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