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Low-Temperature Operation of Polycrystalline Silicon Thin-F..:
Mori, Hiroki
;
Hata, Kiyomi
;
Hashimoto, Takeshi
...
Japanese Journal of Applied Physics. 30 (1991) 12S - p. 3710 , 1991
Link:
https://doi.org/10.1143/jjap.30.3710
RT Journal T1
Low-Temperature Operation of Polycrystalline Silicon Thin-Film Transistors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.30.3710&Exemplar=1&LAN=DE A1 Mori, Hiroki A1 Hata, Kiyomi A1 Hashimoto, Takeshi A1 Wu, I-Wei A1 Lewis, Alan G. A1 Mitsumasa Koyanagi, Mitsumasa Koyanagi PB IOP Publishing YR 1991 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 30 IS 12S SP 3710 LK http://dx.doi.org/https://doi.org/10.1143/jjap.30.3710 DO https://doi.org/10.1143/jjap.30.3710 SF ELIB - SuUB Bremen
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