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1 Ergebnisse
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Damage during Microchanneling Analysis Using 400 keV Helium..:
Hirai, Kouichi
;
Takai, Mikio
;
Atsushi Kinomura, Atsushi Kinomura
.
Japanese Journal of Applied Physics. 31 (1992) 5B - p. L649 , 1992
Link:
https://doi.org/10.1143/jjap.31.l649
RT Journal T1
Damage during Microchanneling Analysis Using 400 keV Helium Ion Microprobe
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.31.l649&Exemplar=1&LAN=DE A1 Hirai, Kouichi A1 Takai, Mikio A1 Atsushi Kinomura, Atsushi Kinomura A1 Susumu Namba, Susumu Namba PB IOP Publishing YR 1992 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 31 IS 5B SP L649 LK http://dx.doi.org/https://doi.org/10.1143/jjap.31.l649 DO https://doi.org/10.1143/jjap.31.l649 SF ELIB - SuUB Bremen
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