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Electron Beam Column Developments for Submicron- and Nanoli..:
Gesley, Mark
;
Abboud, Frank
;
Colby, Dave
..
Japanese Journal of Applied Physics. 32 (1993) 12S - p. 5993 , 1993
Link:
https://doi.org/10.1143/jjap.32.5993
RT Journal T1 <Title>Electron Beam Column Developments for Submicron- and Nanolithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.32.5993&Exemplar=1&LAN=DE A1 Gesley, Mark A1 Abboud, Frank A1 Colby, Dave A1 Frederick Raymond, Frederick Raymond A1 Sterling Watson, Sterling Watson PB IOP Publishing YR 1993 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 32 IS 12S SP 5993 LK http://dx.doi.org/https://doi.org/10.1143/jjap.32.5993 DO https://doi.org/10.1143/jjap.32.5993 SF ELIB - SuUB Bremen
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