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1 Ergebnisse
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Nanoscale Lithography with Electron Exposure of SiO 2 Resis..:
Thomas K. Whidden, Thomas K. Whidden
;
John Allgair, John Allgair
;
Angela Jenkins-Gray, Angela Jenkins-Gray
...
Japanese Journal of Applied Physics. 34 (1995) 8S - p. 4420 , 1995
Link:
https://doi.org/10.1143/jjap.34.4420
RT Journal T1
Nanoscale Lithography with Electron Exposure of SiO 2 Resists
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.34.4420&Exemplar=1&LAN=DE A1 Thomas K. Whidden, Thomas K. Whidden A1 John Allgair, John Allgair A1 Angela Jenkins-Gray, Angela Jenkins-Gray A1 Maroun Khoury, Maroun Khoury A1 Michael N. Kozicki, Michael N. Kozicki A1 David K. Ferry, David K. Ferry PB IOP Publishing YR 1995 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 34 IS 8S SP 4420 LK http://dx.doi.org/https://doi.org/10.1143/jjap.34.4420 DO https://doi.org/10.1143/jjap.34.4420 SF ELIB - SuUB Bremen
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