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1 Ergebnisse
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Fabrication of P-Channel MOS TFT's on Rapid Thermal CVD Pol..:
Lee, Seo-Kyu
;
Kim, Hyung-Geun
;
Chung, Wook-Jin
..
Japanese Journal of Applied Physics. 35 (1996) 2S - p. 919 , 1996
Link:
https://doi.org/10.1143/jjap.35.919
RT Journal T1
Fabrication of P-Channel MOS TFT's on Rapid Thermal CVD PolycrystallineSilicon-Germanium Films
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.35.919&Exemplar=1&LAN=DE A1 Lee, Seo-Kyu A1 Kim, Hyung-Geun A1 Chung, Wook-Jin A1 Bong-Koo Kang, Bong-Koo Kang A1 Ohyun Kim, Ohyun Kim PB IOP Publishing YR 1996 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 35 IS 2S SP 919 LK http://dx.doi.org/https://doi.org/10.1143/jjap.35.919 DO https://doi.org/10.1143/jjap.35.919 SF ELIB - SuUB Bremen
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