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A New Single-Layer Resist for 193-nm Lithography:
Nozaki, Koji
;
Watanabe, Keiji
;
Namiki, Takahisa
...
Japanese Journal of Applied Physics. 35 (1996) 4B - p. L528 , 1996
Link:
https://doi.org/10.1143/jjap.35.l528
RT Journal T1 <Title>A New Single-Layer Resist for 193-nm Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.35.l528&Exemplar=1&LAN=DE A1 Nozaki, Koji A1 Watanabe, Keiji A1 Namiki, Takahisa A1 Igarashi, Miwa A1 Yoko Kuramitsu, Yoko Kuramitsu A1 Ei Yano, Ei Yano PB IOP Publishing YR 1996 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 35 IS 4B SP L528 LK http://dx.doi.org/https://doi.org/10.1143/jjap.35.l528 DO https://doi.org/10.1143/jjap.35.l528 SF ELIB - SuUB Bremen
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