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1 Ergebnisse
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The Increase of the Native Oxide Thickness on H-Terminated ..:
Itoga, Toshihiko
;
Kojima, Hisao
;
Jiro Yugami, Jiro Yugami
.
Japanese Journal of Applied Physics. 36 (1997) 3S - p. 1578 , 1997
Link:
https://doi.org/10.1143/jjap.36.1578
RT Journal T1
The Increase of the Native Oxide Thickness on H-Terminated Si Surfacesby Gaseous Contamination in a Clean Room Atmosphere
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.36.1578&Exemplar=1&LAN=DE A1 Itoga, Toshihiko A1 Kojima, Hisao A1 Jiro Yugami, Jiro Yugami A1 Makoto Ohkura, Makoto Ohkura PB IOP Publishing YR 1997 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 36 IS 3S SP 1578 LK http://dx.doi.org/https://doi.org/10.1143/jjap.36.1578 DO https://doi.org/10.1143/jjap.36.1578 SF ELIB - SuUB Bremen
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