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Charging Damages to Gate Oxides in a Helicon O2 Plasma:
Lin, Wendy
;
Kang, Tzong-Kuei
;
Perng, Yean-Chyi
..
Japanese Journal of Applied Physics. 36 (1997) 12R - p. 7362 , 1997
Link:
https://doi.org/10.1143/jjap.36.7362
RT Journal T1 <Title>Charging Damages to Gate Oxides in a Helicon O2 Plasma</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.36.7362&Exemplar=1&LAN=DE A1 Lin, Wendy A1 Kang, Tzong-Kuei A1 Perng, Yean-Chyi A1 Dai, Bau-Tong A1 Huang-Chung Cheng, Huang-Chung Cheng PB IOP Publishing YR 1997 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 36 IS 12R SP 7362 LK http://dx.doi.org/https://doi.org/10.1143/jjap.36.7362 DO https://doi.org/10.1143/jjap.36.7362 SF ELIB - SuUB Bremen
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