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1 Ergebnisse
1
Process Technology for Next Generation Photomask:
Sohn, Jung-Min
;
Kim, Byung-Gook
;
Choi, Sung-Woon
...
Japanese Journal of Applied Physics. 37 (1998) 12S - p. 6669 , 1998
Link:
https://doi.org/10.1143/jjap.37.6669
RT Journal T1 <Title>Process Technology for Next Generation Photomask</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.37.6669&Exemplar=1&LAN=DE A1 Sohn, Jung-Min A1 Kim, Byung-Gook A1 Choi, Sung-Woon A1 Kim, Jin-Min A1 Cha, Byung-Cheol A1 Yoon, Hee-Sun PB IOP Publishing YR 1998 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 37 IS 12S SP 6669 LK http://dx.doi.org/https://doi.org/10.1143/jjap.37.6669 DO https://doi.org/10.1143/jjap.37.6669 SF ELIB - SuUB Bremen
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