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1 Ergebnisse
1
Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray..:
Hong Goo Lee, Hong Goo Lee
;
Seung Yoon Lee, Seung Yoon Lee
;
Ho Sung Moon, Ho Sung Moon
...
Japanese Journal of Applied Physics. 37 (1998) 12S - p. 6819 , 1998
Link:
https://doi.org/10.1143/jjap.37.6819
RT Journal T1
Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.37.6819&Exemplar=1&LAN=DE A1 Hong Goo Lee, Hong Goo Lee A1 Seung Yoon Lee, Seung Yoon Lee A1 Ho Sung Moon, Ho Sung Moon A1 Sang Hoon Kim, Sang Hoon Kim A1 Joo-Hiuk Sohn, Joo-Hiuk Sohn A1 Jinho Ahn, Jinho Ahn PB IOP Publishing YR 1998 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 37 IS 12S SP 6819 LK http://dx.doi.org/https://doi.org/10.1143/jjap.37.6819 DO https://doi.org/10.1143/jjap.37.6819 SF ELIB - SuUB Bremen
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