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1 Ergebnisse
1
Behavior of F Atoms and CF2 Radicals in Fluorocarbon Plasma..:
Kamisugi, Kunihide Tachibana
;
Takeshi Kawasaki, Takeshi Kawasaki
Japanese Journal of Applied Physics. 38 (1999) 7S - p. 4367 , 1999
Link:
https://doi.org/10.1143/jjap.38.4367
RT Journal T1
Behavior of F Atoms and CF2 Radicals in Fluorocarbon Plasmas for SiO2/Si Etching
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.38.4367&Exemplar=1&LAN=DE A1 Kamisugi, Kunihide Tachibana A1 Takeshi Kawasaki, Takeshi Kawasaki PB IOP Publishing YR 1999 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 38 IS 7S SP 4367 LK http://dx.doi.org/https://doi.org/10.1143/jjap.38.4367 DO https://doi.org/10.1143/jjap.38.4367 SF ELIB - SuUB Bremen
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