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A Two-Pass Excimer Laser Annealing Process toControl Amorph..:
Sala, Luigi Mariucci
Japanese Journal of Applied Physics. 38 (1999) 8B - p. L907 , 1999
Link:
https://doi.org/10.1143/jjap.38.l907
RT Journal T1 <Title>A Two-Pass Excimer Laser Annealing Process toControl Amorphous Silicon Crystallization</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.38.l907&Exemplar=1&LAN=DE A1 Sala, Luigi Mariucci PB IOP Publishing YR 1999 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 38 IS 8B SP L907 LK http://dx.doi.org/https://doi.org/10.1143/jjap.38.l907 DO https://doi.org/10.1143/jjap.38.l907 SF ELIB - SuUB Bremen
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