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1 Ergebnisse
1
Extension of the ArF Excimer Lithography to Sub-0.10 µm Des..:
Satou, Isao
;
Watanabe, Hiroyuki
;
Endo, Masataka
.
Japanese Journal of Applied Physics. 39 (2000) 2R - p. 442 , 2000
Link:
https://doi.org/10.1143/jjap.39.442
RT Journal T1
Extension of the ArF Excimer Lithography to Sub-0.10 µm Design Rule DevicesUsing Bi-layer Silylation Process
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.39.442&Exemplar=1&LAN=DE A1 Satou, Isao A1 Watanabe, Hiroyuki A1 Endo, Masataka A1 Morimoto, Hiroaki PB IOP Publishing YR 2000 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 39 IS 2R SP 442 LK http://dx.doi.org/https://doi.org/10.1143/jjap.39.442 DO https://doi.org/10.1143/jjap.39.442 SF ELIB - SuUB Bremen
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