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Characterization of the Co-Silicide Penetration Depth into ..:
Lee, Hi-Deok
;
Bae, Mi-Suk
;
Ji, Hee-Hwan
...
Japanese Journal of Applied Physics. 41 (2002) Part 1, No. 4B - p. 2445-2449 , 2002
Link:
https://doi.org/10.1143/jjap.41.2445
RT Journal T1
Characterization of the Co-Silicide Penetration Depth into the Junction Area for 0.15 and Sub-0.15 Micron CMOS Technology
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.2445&Exemplar=1&LAN=DE A1 Lee, Hi-Deok A1 Bae, Mi-Suk A1 Ji, Hee-Hwan A1 Lee, Key-Min A1 Park, Seong-Hyun A1 Jang, Myoung-Jun A1 Lee, Joo-Hyoung A1 Yoon, Ki-Seok A1 Choi, Jung-Hoon A1 Park, Geun-Suk A1 Kang, Keun-Koo A1 Park, Young-Jin PB IOP Publishing YR 2002 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 41 IS Part 1, No. 4B SP 2445 OP 2449 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.2445 DO https://doi.org/10.1143/jjap.41.2445 SF ELIB - SuUB Bremen
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