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1 Ergebnisse
1
Ion Beam Lithography Using Membrane Masks:
Kim, Young Suk
;
Hong, Wan
;
Woo, Hyung Joo
...
Japanese Journal of Applied Physics. 41 (2002) Part 1, No. 6B - p. 4141-4145 , 2002
Link:
https://doi.org/10.1143/jjap.41.4141
RT Journal T1 <Title>Ion Beam Lithography Using Membrane Masks</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.4141&Exemplar=1&LAN=DE A1 Kim, Young Suk A1 Hong, Wan A1 Woo, Hyung Joo A1 Choi, Han Woo A1 Kim, Gi Dong A1 Lee, Jin Ho A1 Lee, Samkeun PB IOP Publishing YR 2002 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 41 IS Part 1, No. 6B SP 4141 OP 4145 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.4141 DO https://doi.org/10.1143/jjap.41.4141 SF ELIB - SuUB Bremen
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