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1 Ergebnisse
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Dot-Array Resist Patterning Using Scanning Probe Microscopy..:
Ishibashi, Masayoshi
;
Heike, Seiji
;
Hashizume, Tomihiro
Japanese Journal of Applied Physics. 41 (2002) Part 1, No. 6B - p. 4395-4399 , 2002
Link:
https://doi.org/10.1143/jjap.41.4395
RT Journal T1 <Title>Dot-Array Resist Patterning Using Scanning Probe Microscopy with a Hybrid Current-Voltage Control Method</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.4395&Exemplar=1&LAN=DE A1 Ishibashi, Masayoshi A1 Heike, Seiji A1 Hashizume, Tomihiro PB IOP Publishing YR 2002 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 41 IS Part 1, No. 6B SP 4395 OP 4399 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.4395 DO https://doi.org/10.1143/jjap.41.4395 SF ELIB - SuUB Bremen
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