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Studies of a Reactive Sputter Ion Plating for Preparation o..:
Sung, Youl-Moon
;
Otsubo, Masahisa
;
Honda, Chikahisa
.
Japanese Journal of Applied Physics. 41 (2002) Part 1, No. 11A - p. 6563-6569 , 2002
Link:
https://doi.org/10.1143/jjap.41.6563
RT Journal T1
Studies of a Reactive Sputter Ion Plating for Preparation of TiN Films Using a Facing Target Sputter and Immersed Inductive Coupled Plasma Source
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.6563&Exemplar=1&LAN=DE A1 Sung, Youl-Moon A1 Otsubo, Masahisa A1 Honda, Chikahisa A1 Park, Chung-Hoo PB IOP Publishing YR 2002 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 41 IS Part 1, No. 11A SP 6563 OP 6569 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.6563 DO https://doi.org/10.1143/jjap.41.6563 SF ELIB - SuUB Bremen
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