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1 Ergebnisse
1
Negative Bias Temperature Instability on Plasma-Nitrided Si..:
Ang, Chew-Hoe
;
Lek, Chun-Meng
;
Tan, Shyue-Seng
...
Japanese Journal of Applied Physics. 41 (2002) Part 2, No. 3B - p. L314-L316 , 2002
Link:
https://doi.org/10.1143/jjap.41.l314
RT Journal T1 <Title>Negative Bias Temperature Instability on Plasma-Nitrided Silicon Dioxide Film</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.l314&Exemplar=1&LAN=DE A1 Ang, Chew-Hoe A1 Lek, Chun-Meng A1 Tan, Shyue-Seng A1 Cho, Byung-Jin A1 Chen, Tupei A1 Lin, Wenhe A1 Zhen, Jia-Zheng PB IOP Publishing YR 2002 SN 0021-4922 JF Japanese Journal of Applied Physics VO 41 IS Part 2, No. 3B SP L314 OP L316 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.l314 DO https://doi.org/10.1143/jjap.41.l314 SF ELIB - SuUB Bremen
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