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Effect of Post-Treatments on Atomic Layer Deposition of TiN..:
Yun, Jong-Ho
;
Choi, Eun-Seok
;
Jang, Choel-Min
.
Japanese Journal of Applied Physics. 41 (2002) Part 2, No. 4A - p. L418-L421 , 2002
Link:
https://doi.org/10.1143/jjap.41.l418
RT Journal T1 <Title>Effect of Post-Treatments on Atomic Layer Deposition of TiN Thin Films Using Tetrakis(dimethylamido)titanium and Ammonia</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.41.l418&Exemplar=1&LAN=DE A1 Yun, Jong-Ho A1 Choi, Eun-Seok A1 Jang, Choel-Min A1 Lee, Choon-Soo PB IOP Publishing YR 2002 SN 0021-4922 JF Japanese Journal of Applied Physics VO 41 IS Part 2, No. 4A SP L418 OP L421 LK http://dx.doi.org/https://doi.org/10.1143/jjap.41.l418 DO https://doi.org/10.1143/jjap.41.l418 SF ELIB - SuUB Bremen
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