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1 Ergebnisse
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Heat Sink Dependency of Mask In-Plane Displacement for Extr..:
Chiba, Akira
;
Sugawara, Minoru
;
Yamanashi, Hiromasa
.
Japanese Journal of Applied Physics. 42 (2003) Part 1, No. 6B - p. 3784-3791 , 2003
Link:
https://doi.org/10.1143/jjap.42.3784
RT Journal T1 <Title>Heat Sink Dependency of Mask In-Plane Displacement for Extreme Ultraviolet Lithography</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.42.3784&Exemplar=1&LAN=DE A1 Chiba, Akira A1 Sugawara, Minoru A1 Yamanashi, Hiromasa A1 Nishiyama, Iwao PB IOP Publishing YR 2003 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 42 IS Part 1, No. 6B SP 3784 OP 3791 LK http://dx.doi.org/https://doi.org/10.1143/jjap.42.3784 DO https://doi.org/10.1143/jjap.42.3784 SF ELIB - SuUB Bremen
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