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Dependence of Outgassing Characters at a 157 nm Exposure on..:
Matsui, Yoshinori
;
Umeda, Satoshi
;
Seki, Shu
...
Japanese Journal of Applied Physics. 42 (2003) Part 1, No. 6B - p. 3894-3899 , 2003
Link:
https://doi.org/10.1143/jjap.42.3894
RT Journal T1 <Title>Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.42.3894&Exemplar=1&LAN=DE A1 Matsui, Yoshinori A1 Umeda, Satoshi A1 Seki, Shu A1 Tagawa, Seiichi A1 Ishikawa, Seiichi A1 Itani, Toshiro PB IOP Publishing YR 2003 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 42 IS Part 1, No. 6B SP 3894 OP 3899 LK http://dx.doi.org/https://doi.org/10.1143/jjap.42.3894 DO https://doi.org/10.1143/jjap.42.3894 SF ELIB - SuUB Bremen
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