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Characterization of Nickel-Silicide Dependence on the Subst..:
Bae, Mi-Suk
;
Ji, Hee-Hwan
;
Lee, Hun-Jin
...
Japanese Journal of Applied Physics. 43 (2004) 1 - p. 91-95 , 2004
Link:
https://doi.org/10.1143/jjap.43.91
RT Journal T1 <Title>Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.43.91&Exemplar=1&LAN=DE A1 Bae, Mi-Suk A1 Ji, Hee-Hwan A1 Lee, Hun-Jin A1 Oh, Soon-Young A1 Huang, Bin-Feng A1 Yun, Jang-Gn A1 Wang, Jin-Suk A1 Park, Seong-Hyung A1 Lee, Hi-Deok PB IOP Publishing YR 2004 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 43 IS 1 SP 91 OP 95 LK http://dx.doi.org/https://doi.org/10.1143/jjap.43.91 DO https://doi.org/10.1143/jjap.43.91 SF ELIB - SuUB Bremen
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