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Moisture-Resistive Properties of SiNx Films Prepared by Cat..:
Heya, Akira
;
Niki, Toshikazu
;
Takano, Masahiro
...
Japanese Journal of Applied Physics. 44 (2005) 4R - p. 1923 , 2005
Link:
https://doi.org/10.1143/jjap.44.1923
RT Journal T1
Moisture-Resistive Properties of SiNx Films Prepared by Catalytic Chemical Vapor Deposition below 100°C for Flexible Organic Light-Emitting Diode Displays
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.44.1923&Exemplar=1&LAN=DE A1 Heya, Akira A1 Niki, Toshikazu A1 Takano, Masahiro A1 Yonezawa, Yasuto A1 Minamikawa, Toshiharu A1 Muroi, Susumu A1 Minami, Shigehira A1 Ikari, Tokuo A1 Izumi, Akira A1 Masuda, Atsushi A1 Umemoto, Hironobu A1 Matsumura, Hideki PB IOP Publishing YR 2005 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 44 IS 4R SP 1923 LK http://dx.doi.org/https://doi.org/10.1143/jjap.44.1923 DO https://doi.org/10.1143/jjap.44.1923 SF ELIB - SuUB Bremen
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