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1 Ergebnisse
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Reoxidation Behavior of High-Nitrogen Oxynitride Films afte..:
Lin, Bo Chun
;
Chang, Kow Ming
;
Lai, Chiung Hui
..
Japanese Journal of Applied Physics. 44 (2005) 5R - p. 2993 , 2005
Link:
https://doi.org/10.1143/jjap.44.2993
RT Journal T1
Reoxidation Behavior of High-Nitrogen Oxynitride Films after O2 and N2O Treatment
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.44.2993&Exemplar=1&LAN=DE A1 Lin, Bo Chun A1 Chang, Kow Ming A1 Lai, Chiung Hui A1 Hsieh, Kuang Yeu A1 Yao, June Min PB IOP Publishing YR 2005 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 44 IS 5R SP 2993 LK http://dx.doi.org/https://doi.org/10.1143/jjap.44.2993 DO https://doi.org/10.1143/jjap.44.2993 SF ELIB - SuUB Bremen
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