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1 Ergebnisse
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Properties of High-Performance Porous SiOC Low-k Film Fabri..:
Yoda, Takashi
;
Fujita, Keiji
;
Miyajima, Hideshi
...
Japanese Journal of Applied Physics. 44 (2005) 6R - p. 3872 , 2005
Link:
https://doi.org/10.1143/jjap.44.3872
RT Journal T1
Properties of High-Performance Porous SiOC Low-k Film Fabricated Using Electron-Beam Curing
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.44.3872&Exemplar=1&LAN=DE A1 Yoda, Takashi A1 Fujita, Keiji A1 Miyajima, Hideshi A1 Nakata, Rempei A1 Miyashita, Naoto A1 Hayasaka, Nobuo PB IOP Publishing YR 2005 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 44 IS 6R SP 3872 LK http://dx.doi.org/https://doi.org/10.1143/jjap.44.3872 DO https://doi.org/10.1143/jjap.44.3872 SF ELIB - SuUB Bremen
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