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Impact of Tunnel Etching Process on Electrical Performances..:
Caubet, V.
;
Borel, S.
;
Arvet, C.
...
Japanese Journal of Applied Physics. 44 (2005) 7S - p. 5795 , 2005
Link:
https://doi.org/10.1143/jjap.44.5795
RT Journal T1 <Title>Impact of Tunnel Etching Process on Electrical Performances of SON Devices</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.44.5795&Exemplar=1&LAN=DE A1 Caubet, V. A1 Borel, S. A1 Arvet, C. A1 Bilde, J. A1 Chanemougame, D. A1 Monfray, S. A1 Ranica, R. A1 Mazoyer, P. A1 Skotnicki, T. PB IOP Publishing YR 2005 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 44 IS 7S SP 5795 LK http://dx.doi.org/https://doi.org/10.1143/jjap.44.5795 DO https://doi.org/10.1143/jjap.44.5795 SF ELIB - SuUB Bremen
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