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Large Desorption Yield of Hydrogen Atoms from Silicon Surfa..:
Mori, Toshiki
;
Watanabe, Satoru
Japanese Journal of Applied Physics. 44 (2005) 6L - p. L839 , 2005
Link:
https://doi.org/10.1143/jjap.44.l839
RT Journal T1
Large Desorption Yield of Hydrogen Atoms from Silicon Surface in Homogeneous Electron Injection
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.44.l839&Exemplar=1&LAN=DE A1 Mori, Toshiki A1 Watanabe, Satoru PB IOP Publishing YR 2005 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 44 IS 6L SP L839 LK http://dx.doi.org/https://doi.org/10.1143/jjap.44.l839 DO https://doi.org/10.1143/jjap.44.l839 SF ELIB - SuUB Bremen
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