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1 Ergebnisse
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Novel Back End-of-Line Process Scheme for Improvement of Ne..:
Ho, Won-Joon
;
Park, Sung-Hyung
;
Kim, Dong-Sun
...
Japanese Journal of Applied Physics. 45 (2006) 4R - p. 2455 , 2006
Link:
https://doi.org/10.1143/jjap.45.2455
RT Journal T1
Novel Back End-of-Line Process Scheme for Improvement of Negative Bias Temperature Instability Lifetime
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.45.2455&Exemplar=1&LAN=DE A1 Ho, Won-Joon A1 Park, Sung-Hyung A1 Kim, Dong-Sun A1 Han, In-Shik A1 Lee, Hi-Deok A1 Kim, Jae-Yeong A1 Park, Yu-Be A1 Kim, Dae-Byung PB IOP Publishing YR 2006 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 45 IS 4R SP 2455 LK http://dx.doi.org/https://doi.org/10.1143/jjap.45.2455 DO https://doi.org/10.1143/jjap.45.2455 SF ELIB - SuUB Bremen
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