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1 Ergebnisse
1
Highly Reliable 0.15 µm/14 F2 Cell Ferroelectric Random Acc..:
Heo, Jang-Eun
;
Bae, Byoung-Jae
;
Yoo, Dong-Chul
...
Japanese Journal of Applied Physics. 45 (2006) 4S - p. 3198 , 2006
Link:
https://doi.org/10.1143/jjap.45.3198
RT Journal T1
Highly Reliable 0.15 µm/14 F2 Cell Ferroelectric Random Access Memory Capacitor Using SrRuO3 Buffer Layer
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.45.3198&Exemplar=1&LAN=DE A1 Heo, Jang-Eun A1 Bae, Byoung-Jae A1 Yoo, Dong-Chul A1 Nam, Sang-Don A1 Lim, Ji-Eun A1 Im, Dong-Hyun A1 Joo, Suk-Ho A1 Jung, Yong-Ju A1 Choi, Suk-Hun A1 Park, Soon-Oh A1 Kim, Hee-Seok A1 Chung, U-In A1 Moon, Joo-Tae PB IOP Publishing YR 2006 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 45 IS 4S SP 3198 LK http://dx.doi.org/https://doi.org/10.1143/jjap.45.3198 DO https://doi.org/10.1143/jjap.45.3198 SF ELIB - SuUB Bremen
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