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1 Ergebnisse
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Electrical Properties of Low-Dielectric-Constant SiOC(–H) F..:
Navamathavan, Rangaswamy
;
Oh, Kyoung Suk
;
Chang, Sil Yang
...
Japanese Journal of Applied Physics. 45 (2006) 10S - p. 8435 , 2006
Link:
https://doi.org/10.1143/jjap.45.8435
RT Journal T1
Electrical Properties of Low-Dielectric-Constant SiOC(–H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O2
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.45.8435&Exemplar=1&LAN=DE A1 Navamathavan, Rangaswamy A1 Oh, Kyoung Suk A1 Chang, Sil Yang A1 Kim, Seung Hyun A1 Jang, Yong Jun A1 Jung, An Su A1 Lee, Heon Ju A1 Lee, Kwang Man A1 Choi, Chi Kyu PB IOP Publishing YR 2006 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 45 IS 10S SP 8435 LK http://dx.doi.org/https://doi.org/10.1143/jjap.45.8435 DO https://doi.org/10.1143/jjap.45.8435 SF ELIB - SuUB Bremen
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