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Erratum: "Amorphous Silicon Film Deposition by Low Temperat..:
Lee, Sung-Hyun
;
Hong, Wan-Shick
;
Kim, Jong-Man
...
Japanese Journal of Applied Physics. 45 (2006) 5L - p. L485 , 2006
Link:
https://doi.org/10.1143/jjap.45.l485
RT Journal T1
Erratum: "Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application"
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.45.l485&Exemplar=1&LAN=DE A1 Lee, Sung-Hyun A1 Hong, Wan-Shick A1 Kim, Jong-Man A1 Lim, Hyuck A1 Park, Kuyng-Bae A1 Cho, Chul-Lae A1 Lee, Kyung-Eun A1 Kim, Do-Young A1 Jung, Ji-Sim A1 Kwon, Jang-Yeon A1 Noguchi, Takashi PB IOP Publishing YR 2006 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 45 IS 5L SP L485 LK http://dx.doi.org/https://doi.org/10.1143/jjap.45.l485 DO https://doi.org/10.1143/jjap.45.l485 SF ELIB - SuUB Bremen
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