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1 Ergebnisse
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Which Mask is Preferred for Sub-60 nm Node Imaging?:
Kim, Sung-Hyuck
;
Kim, Soon-Ho
;
Kim, Yong-Hoon
...
Japanese Journal of Applied Physics. 46 (2007) 9S - p. 6124 , 2007
Link:
https://doi.org/10.1143/jjap.46.6124
RT Journal T1 <Title>Which Mask is Preferred for Sub-60 nm Node Imaging?</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.46.6124&Exemplar=1&LAN=DE A1 Kim, Sung-Hyuck A1 Kim, Soon-Ho A1 Kim, Yong-Hoon A1 Lee, Jeung-Woo A1 Woo, Sang-Gyun A1 Cho, Han-Ku A1 Oh, Hye-Keun PB IOP Publishing YR 2007 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 46 IS 9S SP 6124 LK http://dx.doi.org/https://doi.org/10.1143/jjap.46.6124 DO https://doi.org/10.1143/jjap.46.6124 SF ELIB - SuUB Bremen
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