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1 Ergebnisse
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Threshold Voltage Modulation Technique using Fluorine Treat..:
Tai, Kaori
;
Yamaguchi, Shinpei
;
Tanaka, Kazuki
...
Japanese Journal of Applied Physics. 47 (2008) 4S - p. 2345 , 2008
Link:
https://doi.org/10.1143/jjap.47.2345
RT Journal T1
Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.47.2345&Exemplar=1&LAN=DE A1 Tai, Kaori A1 Yamaguchi, Shinpei A1 Tanaka, Kazuki A1 Hirano, Tomoyuki A1 Oshiyama, Itaru A1 Kazi, Salam A1 Ando, Takashi A1 Nakata, Masashi A1 Yamanaka, Mayumi A1 Yamamoto, Ryo A1 Kanda, Sayuri A1 Tateshita, Yasushi A1 Wakabayashi, Hitoshi A1 Tagawa, Yukio A1 Tukamoto, Masanori A1 Iwamoto, Hayato A1 Saito, Masaki A1 Nagashima, Naoki A1 Kadomura, Shingo PB IOP Publishing YR 2008 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 47 IS 4S SP 2345 LK http://dx.doi.org/https://doi.org/10.1143/jjap.47.2345 DO https://doi.org/10.1143/jjap.47.2345 SF ELIB - SuUB Bremen
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