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1 Ergebnisse
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Effect of Etch Stop Layer Stress on Negative Bias Temperatu..:
Chen, Ming-Shing
;
Fang, Yean-Kuen
;
Lee, Tung-Hsing
...
Japanese Journal of Applied Physics. 47 (2008) 4S - p. 2624 , 2008
Link:
https://doi.org/10.1143/jjap.47.2624
RT Journal T1
Effect of Etch Stop Layer Stress on Negative Bias Temperature Instability of Deep Submicron p-Type Metal–Oxide–Semiconductor Field Effect Transistors with Dual Gate Oxide
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.47.2624&Exemplar=1&LAN=DE A1 Chen, Ming-Shing A1 Fang, Yean-Kuen A1 Lee, Tung-Hsing A1 Lin, Chien-Ting A1 Chiang, Yen-Ting A1 Ko, Joe A1 Sheu, Yau Kae A1 Shen, Tsong Lin A1 Liao, Wen Yi PB IOP Publishing YR 2008 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 47 IS 4S SP 2624 LK http://dx.doi.org/https://doi.org/10.1143/jjap.47.2624 DO https://doi.org/10.1143/jjap.47.2624 SF ELIB - SuUB Bremen
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