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1 Ergebnisse
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Investigation of Device Performance and Negative Bias Tempe..:
Han, In-Shik
;
Ji, Hee-Hwan
;
Goo, Tae-Gyu
...
Japanese Journal of Applied Physics. 47 (2008) 4S - p. 2628 , 2008
Link:
https://doi.org/10.1143/jjap.47.2628
RT Journal T1
Investigation of Device Performance and Negative Bias Temperature Instability of Plasma Nitrided Oxide in Nanoscale p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor's
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.47.2628&Exemplar=1&LAN=DE A1 Han, In-Shik A1 Ji, Hee-Hwan A1 Goo, Tae-Gyu A1 Yoo, Ook-Sang A1 Choi, Won-Ho A1 Na, Min-Ki A1 Kim, Yong-Goo A1 Park, Sung-Hyung A1 Lee, Heui-Seung A1 Kang, Young-Seok A1 Kim, Dae-Byung A1 Lee, Hi-Deok PB IOP Publishing YR 2008 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 47 IS 4S SP 2628 LK http://dx.doi.org/https://doi.org/10.1143/jjap.47.2628 DO https://doi.org/10.1143/jjap.47.2628 SF ELIB - SuUB Bremen
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