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1 Ergebnisse
1
Effects of Plasma Process Induced Damages on Organic Gate D..:
Kim, Doo-Hyun
;
Kim, Dong-Woo
;
Kim, Keon-Soo
...
Japanese Journal of Applied Physics. 47 (2008) 7R - p. 5672 , 2008
Link:
https://doi.org/10.1143/jjap.47.5672
RT Journal T1
Effects of Plasma Process Induced Damages on Organic Gate Dielectrics of Organic Thin-Film Transistors
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.47.5672&Exemplar=1&LAN=DE A1 Kim, Doo-Hyun A1 Kim, Dong-Woo A1 Kim, Keon-Soo A1 Kim, Hyoung-Jin A1 Moon, Ji-Sun A1 Hong, Mun-Pyo A1 Kim, Bo-Sung A1 Shin, Jung-Han A1 Kim, Young-Min A1 Song, Keun-Kyu A1 Shin, Seong-Sik PB IOP Publishing YR 2008 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 47 IS 7R SP 5672 LK http://dx.doi.org/https://doi.org/10.1143/jjap.47.5672 DO https://doi.org/10.1143/jjap.47.5672 SF ELIB - SuUB Bremen
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