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1 Ergebnisse
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Nanoscale Multigate TiN Metal Nanocrystal Memory Using High..:
Lu, Chi-Pei
;
Luo, Cheng-Kei
;
Tsui, Bing-Yue
...
Japanese Journal of Applied Physics. 48 (2009) 4S - p. 04C059 , 2009
Link:
https://doi.org/10.1143/jjap.48.04c059
RT Journal T1 <Title>Nanoscale Multigate TiN Metal Nanocrystal Memory Using High-k Blocking Dielectric and High-Work-Function Gate Electrode Integrated on Silcon-on-Insulator Substrate</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.48.04c059&Exemplar=1&LAN=DE A1 Lu, Chi-Pei A1 Luo, Cheng-Kei A1 Tsui, Bing-Yue A1 Lin, Cha-Hsin A1 Tzeng, Pei-Jer A1 Wang, Ching-Chiun A1 Tsai, Ming-Jinn PB IOP Publishing YR 2009 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 48 IS 4S SP 04C059 LK http://dx.doi.org/https://doi.org/10.1143/jjap.48.04c059 DO https://doi.org/10.1143/jjap.48.04c059 SF ELIB - SuUB Bremen
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