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1 Ergebnisse
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Diffusion of Indium Implanted in Silicon Oxides:
Chang, Ruey-Dar
;
Ling, Yu-Ting
;
Liu, Taylor
..
Japanese Journal of Applied Physics. 48 (2009) 5R - p. 056501 , 2009
Link:
https://doi.org/10.1143/jjap.48.056501
RT Journal T1 <Title>Diffusion of Indium Implanted in Silicon Oxides</Title> UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.48.056501&Exemplar=1&LAN=DE A1 Chang, Ruey-Dar A1 Ling, Yu-Ting A1 Liu, Taylor A1 Tsai, Jung-Ruey A1 Ma, Chia-Chi PB IOP Publishing YR 2009 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 48 IS 5R SP 056501 LK http://dx.doi.org/https://doi.org/10.1143/jjap.48.056501 DO https://doi.org/10.1143/jjap.48.056501 SF ELIB - SuUB Bremen
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