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1 Ergebnisse
1
Hard-Mask-Through UV-Light-Induced Damage to Low-k Film dur..:
Matsunaga, Noriaki
;
Okumura, Hirokatsu
;
Jinnai, Butsurin
.
Japanese Journal of Applied Physics. 49 (2010) 4S - p. 04DB06 , 2010
Link:
https://doi.org/10.1143/jjap.49.04db06
RT Journal T1
Hard-Mask-Through UV-Light-Induced Damage to Low-k Film during Plasma Process for Dual Damascene
UL https://suche.suub.uni-bremen.de/peid=cr-10.1143_jjap.49.04db06&Exemplar=1&LAN=DE A1 Matsunaga, Noriaki A1 Okumura, Hirokatsu A1 Jinnai, Butsurin A1 Samukawa, Seiji PB IOP Publishing YR 2010 SN 0021-4922 SN 1347-4065 JF Japanese Journal of Applied Physics VO 49 IS 4S SP 04DB06 LK http://dx.doi.org/https://doi.org/10.1143/jjap.49.04db06 DO https://doi.org/10.1143/jjap.49.04db06 SF ELIB - SuUB Bremen
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